VLADIVOSTOK, September 6. /TASS/. A domestic lithography machine to produce 130 nanometer (nm) chips will be created in 2026 and the 90-65 nm topology is planned to be achieved over time, Russian Minister of Industry and Trade Anton Alikhanov told TASS at the Eastern Economic Forum.

Russia is among several countries capable of creating its own lithography machines, the minister said. The first commercial specimen of the lithographic printer operating on the 350 nm topology already appeared this year.

"The lithography machine to operate on the 130 nm topologies will be created in 2026. Lasers for these devices are also being developed in the country. Plans are to announce the next work to achieve the 90-65 nm topology," Alikhanov added.

The Eastern Economic Forum (EEF) is underway on the campus of the Far Eastern Federal University in Vladivostok on September 3-6, 2024. The main theme of the EEF in 2024 is "Far East 2030. Combining strengths to create new potential." The Roscongress Foundation has served as the Forum’s organizer since 2016. TASS is the general information partner of the EEF.