SIRIUS, September 28. /TASS/. Russia and Belarus have manufactured a prototype 130-nanometer lithography machine, Russian First Deputy Prime Minister Denis Manturov said at the plenary session of the Microelectronics forum.

"Together with our Belarusian friends, a prototype of a 130-nanometer system has already been manufactured, and a proprietary excimer laser was developed for it, which allowed Russia to join the narrow group of countries possessing this technology," he said.

Electron-beam lithography, which is used among other things for photomask fabrication, is also progressing. To support their production, the establishment of a research and technology center is nearing completion in Zelenograd. This project involves the phased mastering of topological standards down to the 28-nanometer stages of chip production, the official noted.

"Concurrently, competencies in the field of materials and chemical products are being expanded. Over the past three years, the production of around 60 critical items has been mastered here, and approximately the same number of items are expected to enter the market by 2029," the First Deputy Prime Minister added.